Abstract: Contact lithography techniques, such as imprint nano-molding show great promise in the ability to transfer nanoscale patterns in an efficient, economic fashion. We have found that polymer networks composed of a mixture of photopolymerizable monomers (acrylates and methacrylates) can be molded and photocured, providing image transfer. The use of these nanoscopically printed materials as sacrificial resist layers is obvious but does not take advantage of the chemistry presented at the surface of the patterned polymer. We have been exploring metal/polymer interfaces of the patterned networks and subsequent modification of network functionality. We add functional comonomer to our photopolymer resin and after molding a fraction of this incorporated functionality is present at the surface of the polymer and available for subsequent reactions. Now we report the ability to electrolessly plate metals from the functionalized patterned surface. These patterned materials are finding utility as high contrast resists and templates for electronic test structures. The synthesis, characterization and use of these new materials are discussed.