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Abstract: Contact lithography techniques, such as imprint lithography show great promise in the ability to transfer nanoscale patterns in a efficient, economic fashion. We have found the networks composed of a mixture of photopolymerizable monomers (acrylates and methacrylates) can be molded and photocured, providing image transfer. The use of these nanoscopically printed materials as sacrificial resist layers is obvious but does not take advantage of the chemistry presented at the surface of the patterned polymer. We have been exploring the modification of the photopolymer network composition, incorporating functional co-monomers (imimers, etc.) that allow for secondary modification of the patterned surface. We have demonstrated graft polymerizations from patterned surfaces and the ability to adjust feature sized and chemical functionality in the nanometer size regime. Additionally, we have been exploring metal/polymer interfaces of the patterned networks and subsequent modification of network functionality. These patterned materials are finding utility as high contrast resists and templates for electronic test structures. The synthesis, characterization and use of these new materials are discussed.