Authors: Katada N
, Akazawa S
, Niwa M
Improvement of selectivity in specific adsorption by the addition of acetic acid during the CVD of silicon alkoxide to form a silica overlayer with a molecular sieving property.
Publication date: 2004
Journal: Chemical Vapor Deposition
Abstract: The CVD of silicon alkoxide was carried out on a tin oxide surface coated with pre-adsorbed carboxylate anions as templates. During the deposition of alkoxide, acetic acid was added in order to accelerate the formation of siloxane. After removal of the template and acetic acid, both the template molecule itself and the smaller molecule were adsorbed, while the adsorption of larger molecules was almost completely suppressed. The shape-selective adsorption capacity was thus observed, and the presence of a cavity, the shape and size of which were controlled by the template molecule, is suggested
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