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Reference type: Journal
Authors: Choi KM, Rogers JA
Article Title: High-performance PDMS silicon elastomer molecularly designed for fabricating nano-scaled plastric/organic electronics and microfluidic devices.
Publication date: 2004
Journal: Abstracts of Papers of the American Chemical Society
Volume: 227
Issue: (INOR)
Page numbers: 977.
Alternative URL: http://www.acs.org/portal/resources/ACS/Subportals/inorganic/inor_sep_0304.pdf

Abstract: Soft lithography is an alternative to photolithography which has attracted much attention in microfabrication by making stamps, molding, and contact-printing processes due to its low cost and easy processability, for fabricating particularly in plastic electronics and microfluidic devices. The resolution of pattern transfer relies on the elastomeric elements. However, commercially available silicon elastomers often result in collapse and mergence due to their low mechanical strength, especially in the nano-scale regime (<100nm). These limitations have motivated us to develop new stiff, photocured silicon elastomers, which satisfy a diverse set of demands, such as enhanced physical stiffness, elastomeric properties, and low shrinkage. The designed silicon elastomer shows an excellent stamping capability with high resolution compared to commercial PDMS stamps, especially in the nano-feature's pattern transfers. Microfluidic droplet reactor is also fabricated using the new photocurable PDMS material for microscale synthesis of nano-particles. We also developed molecularly imprinted polymers (MIP) to fabricate patterns or to form uniform particles with specific functionalities such as molecular recognition.


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