Inventors: Zhang YY, Zhang TL, Wu YY, Zhang PW, Chen N
Patent Title: Silicon-based copper (II) ion surface imprinted material and preparation method thereof
Publication date: 2018
Publication number: CN107602784A

Abstract: The invention provides a silicon-based copper (II) ion surface imprinted material. The material is prepared through a copolymerization reaction of an unsaturated quaternary ammonium cation modified salicylaldoxime copper (II) complex serving as a functional monomer, polyallyl ammonium salt serving as a crosslinking agent and a framework monomer on the surface of porous silica gel, is used as a solid phase imprinting two-position extraction agent for copper (II), is used for selective enrichment and separation of copper (II) ions in water systems and has the function and characteristic of simultaneously extracting and contending with anions. An effective method is provided for removing the copper (II) ions in all the water systems as well as selective enrichment or separation of the copper(II) ions in all the water systems.
URL: https://worldwide.espacenet.com/publicationDetails/biblio?CC=CN&NR=107602784A&KC=A&FT=D&DB=EPODOC&locale=en_EP&date=20180119