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Chemical Vapor Deposition


Improvement of selectivity in specific adsorption by the addition of acetic acid during the CVD of silicon alkoxide to form a silica overlayer with a molecular sieving property
Chemical Vapor Deposition10 (2), 103-107.
DOI: 10.1002/cvde.200306278


Silica overlayers prepared using organic template molecules on tin oxide and its molecular sieving property
Chemical Vapor Deposition3 (1), 59-66.
DOI: 10.1002/cvde.19970030109


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