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Reference type: Journal
Authors: Katada N, Akazawa S, Nishiaki N, Yano Y, Yamakita S, Hayashi K, Niwa M
Article Title: Formation of selective adsorption cavity by chemical vapor deposition of molecular sieving silica overlayer on alumina using molecular template in the presence of acetic acid.
Publication date: 2005
Journal: Bulletin of the Chemical Society of Japan
Volume: 78
Issue: (6)
Page numbers: 1001-1007.
DOI: 10.1246/bcsj.78.1001
Alternative URL: https://www.jstage.jst.go.jp/article/bcsj/78/6/78_6_1001/_article

Abstract: Chemical vapor deposition (CVD) of tetramethoxysilane was carried out on alumina after the pre-adsorption of aldehyde as the molecular template, in order to form a molecular-sieving silica overlayer with controlled cavities. The adsorption of a molecule (1-naphthaldehyde) larger than the template was almost completely suppressed when acetic acid was added during CVD, showing a high selectivity based upon the shapes of the controlled cavity and the adsorbed molecule, while the selectivity was low when acetic acid was not used. The infrared (IR) spectrum and nuclear magnetic resonance (NMR) of Si-29 showed that the acetic acid enhanced the oligomerization of Si alkoxide via hydrolysis, probably by acid catalysis, resulting in the formation of a dense network of siloxane. Such a dense wall of silica is speculated to determine the shape of the adsorption cavity precisely, and to generate high selectivity
Template and target information: benzaldehyde


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