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Inventors: Soppera OA, Haupt K
Patent Title: Method for producing molecularly imprinted (co)polymers by photopolymerization under evanescent waves, (co)polymers obtained and uses thereof
Publication date: 2009
Publication number: WO/2009/090326

Abstract: The present invention relates to the field of the synthesis of molecularly imprinted (co)polymers and the subject matter of the present invention is a method for the production thereof. It also relates to the use of the substances obtained by virtue of said method for various uses and the devices which follow therefrom. Said method is characterized by a photopolymerization wherein one face of a substrate bearing the substances to be reacted is irradiated with radiation or light rays having a wavelength of between 150 nm and 1200 nm in order to form evanescent waves so as to form said molecularly imprinted (co)polymer, with subsequent rinsing thereof with at least one appropriate solvent so as to remove all or part of the monomer(s) which has (have) not polymerized and all or part of the target entity (or entities) or molecule(s), where appropriate, the resulting final product being detached from said substrate.
URL: http://v3.espacenet.com/publicationDetails/biblio?DB=EPODOC&adjacent=true&locale=en_gb&FT=D&date=20090723&CC=WO&NR=2009090326A1&KC=A1

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