Inventors: Liu ZS, Sun X, Li XY, Huang YP
Patent Title: Cetirizine molecularly imprinted polymer monolithic column and preparation method thereof
Publication date: 2014
Publication number: CN104209104

Abstract: The invention relates to a cetirizine molecularly imprinted polymer monolithic column and a preparation method thereof. The cetirizine molecularly imprinted polymer monolithic column is composed of raw materials of, by mass, 1-3% of cetirizine, 3-4% of 4-vinyl pyridine, 20-25% of ethylene gylcol dimethacrylate, 42-45% of mixed solution (eutectic solvent) of ethylene glycol and choline chloride, 4-5% of dimethylformamide, 13-22% of 1-butyl-3-methylimidazolium tetrafluoro borate and 0.5-1% of azobisisobutyronitrile. The method includes the steps of adding ionic liquid and the eutectic solvent of ethylene glycol and choline chloride to a polymerization system, using cobalt ions as a metal ion hub to enhance the effect of imprinting recognition, and preparing molecularly imprinted polymer (MIP) of a successive rod shape in a stainless steel column. The cetirizine molecularly imprinted polymer (MIP) monolithic column obtained through the preparation method has the advantages of good permeability and obvious imprinting effects and can have the model cetirizine imprinting factors up to 31.54, and meanwhile, the method is simple in preparation process and avoids the use of volatile liquid, thereby reducing harmful gas emission to the environment.
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